Vacuum Coating

PVD Systems

Vacuum Coating

MBRAUN designs coating systems for a variety of thin film applications with a broad range of options and customized solutions. Coating systems at MBRAUN incorporate all main evaporation technologies including resistive thermal evaporation, temperature controlled evaporation (ex. Organic material), electron beam evaporation w/ multiple pocket arrangements, RF, DC or Pulsed DC Magnetron Sputtering and also reactive RF magnetron sputtering w/ reactive gases.

MINIvap

Can be integrated in existing MBRAUN gloveboxes (through antechamber)

  • For substrates up to 50 x 50 mm wafers
  • Compact design
  • Economic solution
  • Short delivery time
  • Fast and easy installation
  • Easy retrofit in existing gloveboxes

Applications

Brochure

Video

PROvap

  • Glovebox integrated system
  • Compact and cost-effective solution
  • Easy configuration design
  • Co-deposition
  • Uniformity up to +/-3 % (with specific geometry design up to +/1 %)
  • Two standard-sizes: PROvap 4G and PROvap 5G
  • Up to 8 deposition sources possible
  • Substrate size up to 100x100 mm or diam. 100 mm (4”) for PROvap 4G
  • Substrate size up to 150x150 mm or diam. 150 mm (6”) for PROvap 5G

UNIvap

  • Standalone system
  • Compact and cost-effective solution
  • Easy configuration design
  • Co-deposition is possible
  • Uniformity up to +/-3 % (with specific geometry design up to +/1 %)
  • Two standard-sizes: UNIvap 4S and UNIvap 5S
  • Up to 8 deposition sources possible
  • Substrate size up to 100x100 mm or diam. 100 mm (4”) for UNIvap 4S
  • Substrate size up to 150x150 mm or diam. 150 mm (6”) for UNIvap 5S

OPTIvap

  • Flexible, modular system
  • Stand-alone (S) or glovebox integrated (G)
  • Building block for cluster tool
  • Multi-substrate & multi-mask processes
  • Standard uniformity: +/- 3 % (with specific geometry design up to +/1 %)
  • Substrate size up to 150x150 mm or diam. 150 mm (6“) for OPTIvap 4
  • Substrate size up to 200x200 mm or diam. 280 mm (8“) for OPTIvap 6

 

Applications:

  • Complex multilayer devices (OLED,OPV)
  • Optical layers
  • Semiconductor, PV

MINIPEROvap

Mini PVD Chamber 100% dedicated to Perovskites

  • Can be integrated in existing MBRAUN gloveboxes (through antechamber)
  • Compact design
  • For substrates up to 50x50 mm
  • Up to 4 sources
  • Layer uniformity < +/-5 %
  • Economic solution
  • Short delivery time
  • Easy retrofit in existing gloveboxes

PEROvap

Specially designed for Perovskites

  • Ideal tool for efficient R&D
  • Special system design
  • Special precursor source
    • High stability at low temperature
  • Stable and defined deposition process
    • High vacuum conditions
    • Low cross-talk
  • High repeatability
  • Material compatibility for a very long lifetime
  • Patent pending

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