Options & Upgrades for Vacuum Coating Systems
Our vacuum coating systems can be flexibly adapted to meet a wide range of process requirements. Since we develop, design, and manufacture our own vacuum chambers, custom modifications, extensions, and special solutions can be optimally integrated into the overall system.
In addition to versatile coating technologies such as thermal evaporation, electron beam evaporation, and magnetron sputtering, MBRAUN offers a comprehensive portfolio of options and upgrades, including heating and cooling systems for substrate temperature control, tilted substrate stations for GLAD, handling solutions ranging from in-chamber transfer systems to fully automated cluster tools, and much more.
Low Temperature Evaporator (LTE)
- Gentle evaporation of sensitive organic and sublimable materials
- Precisely temperature-controlled LTE sources for stable process conditions
- Uniform and reproducible thin film deposition
- Ideal for demanding coating processes in research and production
- High process stability through precise temperature control
- Ideal for integration into MBRAUN vacuum coating systems
Details
With an operating temperature of up to 800°C and a control accuracy of ±0.1 K, LTE sources provide maximum process stability and excellent reproducibility. Thanks to the availability of different standard sizes, system configurations can be optimized for the required film thicknesses, ranging from just a few nanometers to several micrometers while maintaining excellent film uniformity. For applications with higher material requirements, versions with 100 cm³ or larger source volumes are available upon request.
Thanks to their precise temperature control and flexible scalability, LTE sources are ideally suited for applications in OLEDs, solar technologies, and organic electronics. They also provide a reliable and efficient solution for battery-related processes, for example those involving lithium.
Application
High Temperature Evaporator (HTE)
- Developed for temperature-controlled evaporation of organic and high-temperature materials
- Precise and stable process control even at high evaporation temperatures
- Optimized design for demanding high-temperature processes
- Suitable for reproducible thin film deposition
- High process stability through precise temperature regulation
- Ideal for integration into MBRAUN vacuum coating systems
Details
Thanks to its specialized design, the HTE reliably evaporates not only organic materials but also metals such as aluminum and silver. With operating temperatures up to 1200°C and a control accuracy of ±0.1 K, it covers a broad range of modern coating applications. For particularly demanding applications, process temperatures up to 1400°C are available upon request.
HTE sources combine excellent thermal stability with precise process control, making them ideal for OLED, solar, and thin film technologies, as well as other high-temperature coating processes.
Application
Thermal Evaporator (THE)
- High-performance thermal evaporator for conventional metal coatings in PVD applications
- Specially developed source design for high process reproducibility
- Minimization of re-evaporation effects from adjacent processes
- Stable process conditions for consistently high coating quality
- Suitable for precise and reliable metal deposition
- Ideal for integration into MBRAUN vacuum coating systems
- Also available as a retrofit for existing systems
Details
The THE can be equipped with boats made of molybdenum, tungsten, or tantalum, as well as a wide variety of other heating elements. Alternatively, specially developed ceramic heating elements are available, offering significant advantages when evaporating materials such as aluminum.
With power ratings of up to 2 kW and an optimized source geometry, the THE is ideally suited for reliable metal evaporation at temperatures of up to 1800°C, providing a powerful and versatile solution for demanding thin film and metallization processes in research, development, and production.
Application
Magnetron Sputtering System
- High-performance magnetron sputtering sources for versatile coating processes
- Flexible configuration for various process requirements
- Available with source sizes up to 4 inches
- Suitable for precise coating of a wide variety of substrates
- Efficient and reproducible PVD processes
- Integrated source shutters included
- Compatible with RF, DC, and pulsed DC applications
- Can be integrated into MBRAUN PVD systems
Details
Depending on the application, both metallic and non-metallic targets can be deposited reliably using DC or RF sputtering. With power supplies up to 1500 W, the systems support both high-rate processes optimized for target size and applications involving bonded targets. Reactive gas processes can also be integrated upon request, enabling the targeted deposition of oxides, nitrides, and other functional coatings.
Magnetron sputtering combines excellent process stability with exceptional versatility and user-friendly operation. High-quality, reproducible coating results can be achieved with minimal training, making it ideal for research, development, and industrial production alike.
Application
Electron Beam Evaporation (E-Beam)
- Electron beam evaporation for high-melting-point materials and demanding PVD processes
- Suitable for metals as well as ceramic materials such as silicon
- Rate-controlled process for reproducible coating results
- Sequential deposition of different materials without breaking vacuum
- Flexible configuration with selectable pocket count
- Power ratings up to 6 kW for scalable processes up to pilot production
Details
Electron beam evaporation is a key coating technology for PVD processes, particularly for high-melting-point materials. It is suitable for both metallic and ceramic materials such as silicon and enables precise, homogeneous thin film deposition. Rate-controlled processing ensures reproducible and repeatable coating results. Another major advantage is the ability to deposit multiple materials sequentially without breaking vacuum or manually changing materials.
With power levels of up to 6 kW and configurable pocket capacities, the systems can be optimally adapted to a wide variety of process requirements and scaled up to pilot production.
Application
In-Chamber Transfer System
- In-chamber transfer system for automated process sequences within the vacuum chamber
- Suitable for complex layer structures with multiple masks
- Flexible sequential processing of multiple substrates with different masks without breaking vacuum
- No manual intervention or intermediate venting required
- Increased process stability and reproducibility
- Efficient integration into MBRAUN PVD systems with a minimized footprint
Details
Our transfer system significantly reduces process times while allowing flexible combinations of different mask configurations. It is ideal for research applications requiring identical layer structures with varying geometries, as well as for reproducible processing of established recipes in pilot-scale production.
The integrated PLC control system ensures precise automated process management while meeting the highest requirements for flexibility, reproducibility, and efficiency.
Application
Substrate Temperature Control
- Freely configurable heating systems for additional temperature treatments
- Suitable for annealing and tempering processes
- Supports processes involving layer recombination
- Various heating technologies available to match process requirements
- Precise temperature control for stable and reproducible results
Details
Our PVD systems can be equipped with freely configurable heating systems for targeted substrate temperature treatment. Both contact heating and radiant heating systems with temperatures up to 1000°C are available for annealing and tempering processes. Combined substrate heating and cooling systems down to -40°C are also available upon request, for example to minimize re-evaporation effects when used together with high-temperature evaporation sources.
When combined with an in-chamber transfer system, additional advantages are achieved in terms of process time and flexibility, particularly for research and development, where reproducible samples can be efficiently produced under varying process conditions.
Application
Substrate Wedge
- Substrate wedge for creating different layer combinations on a single substrate
- Selective exposure of defined coating areas
- Efficient evaluation of various process and material combinations
- Ideal for screening and optimization processes in research & development
- Reduced material consumption and testing time through combined experimental setups
Details
The substrate wedge enables different layer combinations to be deposited selectively on a single substrate. By exposing defined coating regions, different material and process parameters can be evaluated efficiently, providing a major advantage for research, development, and thin film analysis.
The wedge is available in both single-blade and dual-blade versions. The single-blade wedge enables stepwise deposition to create targeted film gradients and variations, while the dual-blade wedge allows selective coating of individual areas, enabling multiple different layer systems to be deposited on a single substrate without changing substrates or interrupting the process. This allows coating systems to be evaluated and compared much more efficiently.
Application
Substrate Carriers and Masks
- Custom-designed substrate carriers and masking systems for maximum process flexibility
- Precisely tailored to your specific system and process requirements
- Fully compatible with our automated handling systems
- Efficient and reproducible process sequences, even for complex coating processes
- Optimized for maximum process reliability and consistent quality
Details
For particularly sensitive materials, mask carriers can be designed as non-contact masks to prevent mechanical stress and potential substrate damage. In combination with heating systems, optional heat spreaders provide optimized temperature distribution and improved film uniformity during the coating process.
For demanding applications involving corrosive materials, customized solutions are also available. Carriers can be manufactured from 316 stainless steel (V4A) or equipped with special anti-corrosion coatings, resulting in durable, robust, and precisely engineered components for the highest requirements in research, development, and production.
Application
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