Solutions for Spin Coating in a Glovebox
Spin Coating Under a Controlled Atmosphere
MBRAUN enables spin coating processes under ultra-pure inert gas conditions, providing the ideal environment for coating applications. Our glovebox systems ensure a consistently stable and precisely controlled atmosphere, allowing even the most sensitive materials to be processed safely and reliably.
- Reliable processing of sensitive materials under controlled conditions
- Protection against unwanted reactions caused by oxygen or moisture
- Stable process conditions for reproducible results
- Safe handling of solvent-based systems
For particularly demanding applications, our laminar flow solutions provide additional value. They create an almost particle-free environment and reduce the risk of contamination to a minimum, ensuring even greater process reliability and outstanding coating results.
MBRAUN as Your System Integrator for Spin Coating
We are happy to advise you on selecting suitable spin coaters from our established network of technology partners.
In addition, we support you throughout every phase of your project—from the initial concept to successful commissioning. By coordinating all system components, we create a fully integrated solution that ensures both efficiency and process reliability. This means you receive not just individual components, but a perfectly coordinated complete system from a single source.
Our Scope of Services Includes:
- Selection and specification of suitable spin coating systems
- Mechanical integration into new or existing gloveboxes
- Planning and implementation of media supply and process interfaces
- Development of comprehensive safety concepts
- Centralized project coordination and implementation
To further improve ergonomics, in addition to standard bench-top integration, recessed installation into the glovebox floor (in-deck installation) is also available.
Spin coating is an established process for producing homogeneous thin films and is widely used in both research and industrial applications. A defined amount of liquid coating solution is dispensed onto the center of a rotating substrate. The resulting centrifugal force distributes the material uniformly across the entire surface, creating a precisely controllable thin film.
The process is particularly valued for its simplicity, high reproducibility, and the ability to accurately control film thicknesses in the micro- and nanometer range.
Spin coating, is a well-established process for producing uniform thin films. The liquid coating solution is applied to a substrate, which is then rotated at high speed of up to 10,000 rpm. The resulting centrifugal force distributes the material evenly across the surface, enabling the formation of highly uniform coatings. Both material parameters (e.g., viscosity and surface properties) and process parameters (e.g., acceleration, rotational speed, and dispensing timing) can be optimized to achieve the desired coating quality.
Spin coating is used whenever thin, uniform, and reproducible coatings are required on smooth, flat substrates. The process is particularly suitable for liquid coating materials and is widely used in semiconductor manufacturing for applying photoresists to wafers, in optics for coating lenses and glass, and in research and development for thin films, polymers, and nanomaterials.
Your Benefits at a Glance:
Interested in a Spin Coating Solution Under an Inert Gas Atmosphere?
Contact us - our experts will be happy to discuss your requirements.