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MB-Sources

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01E_TFD18

Thin film deposition systems by MBRAUN include a variety of ways of depositing layers of material onto substrates. Our systems can be custom configured to include different coating techniques to meet the customer's exact specification.

Features

MB Thermal Source

  • Single and double source set up available.
  • Max. electrical power 2000VA
  • Max. temperature depends on the used boat (e.g. Tungsten à up to 1800°C)
  • Thermal sources are used for metals like Ag, Ar, Al,...
  • Deposition rate controled by the electrical power
  • Co-evaporation available

MB Organic Source

  • Source for R&D or small series production
  • Various crucible sizes
  • Single or double source configuration
  • Integrated shutter*

MB E-beam

  • Tightly controlled beam spot distribution
  • Optimized beam deflection system
  • Highly efficient crucible & magnet cooling system
  • Compact design

MB Sputter

  • Sources are available in 3 different standard sizes: 2", 3" and 4"
  • Configured with RF, DC, pulsed DC, or MF power supplies.
  • Special sources on request!

*Organic source shutter sold separately in US and Canada.

Options

Substrate Shutter

  • Electro-pneumatic baffle as shutter for substrate as protection from unintended deposition of material during power up of the sources.
  • Height adjustable

Source Shutter

  • Pivot shutter
  • Flip shutter

Substrate Holders

  • Variety of configurations depending on chamber
  • Cooled substrate holders including mask alignment
  • Manual and auto configurations available

Substrate Heating

  • Quartz lamp heater with 500W lamp
  • Temperature range up t200°C
  • Accuracy: +/- 10°C for 4'' substrates
  • Includes thermocouple, temperature controller and power supply
  • Note: Required feedthroughs 2pc.

MB EVAP Controller Options

  • Quartz sensor
  • Evap monitor 160
  • Evap controller 310
  • Evap PLC controller

Specifications

Specification will vary depending on configuration.

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