header product coating

MB-OptiVap

2_MB-OptiVap 3_MB-OptiVap 4_MB-OptiVap 5_MB-OptiVap 6_MB-OptiVap 01E_TFD17
1_MB-OptiVap

The MB-OptiVap series is the current high-end solution in MBRAUN's deposition tool series. Designed for the requirements of specialized research up to pilot scale production, these tools find frequent use in industrial laboratories and state-of-the-art Universities throughout the world. Offering the same quality standards, flexibility, reliability and the same precision as the ProVap and EcoVap series, the MB OptiVap has additional features and available options. Amongst many tailored solutions the predominant aspects of this system are automatic substrate handling under high-vacuum conditions, automatic mask storage and changing, self-alignment capabilities and a sophisticated process tracking & tracing software. The latter acts as a supervisory process control solution that allows embedding the tool into an array of other process tools in order to create a complete fully automated pilot line with comprehensive and substrate specific log-files.

When standard deposition tools reach their limits choose the MB-OptiVap. Please contact us if you have questions choosing the right thin film deposition system for your specification needs.

Features

  • For substrates up to 300x300 mm or 300 mm wafers
  • Open platform to meet unconventional coating needs
  • Comprehensive set of automated components
  • Hinged rear service door
  • Ergonomic sliding front door
  • Shielded view ports for visual process monitoring
  • Recipe programmable PLC control
  • Removable protective shielding
  • Compatible with all standard deposition sources
  • Ergonomic to operate, easy to clean
  • Available as system embedded version, glovebox integrated and stand alone
  • All stainless steel construction
  • UL listed and CE compliant

Options

  • Automated substrate transfer
  • Automated mask changing
  • Auto-alignment systems
  • Multi-chamber (cluster) designs
  • Tracking and tracing process control software
  • RF or DC sputtering
  • Single and multi-pocket E-beam
  • Multi-source thermal metal deposition
  • Multi-source organic evaporation
  • Co-evaporation capabilities
  • Variety of available pump stacks (incl cryo-pumps)
  • Rate & thickness control
  • Source & substrate shutters

Specifications

Please Note: specification may vary depending on configuration

Vacuum Chamber Specs:

Rectangular Chamber Design

  • Dimensions depending on substrate size and quantity of sources
  • Full stainless steel with rear hinged service door
  • Front door in sliding design or gatevalve
  • Removable protective shielding
  • Base flange with high vacuum ports for source mounting
  • Top flange with high vacuum feedthroughs for additional components
  • DN160 interface for vacuum pump stack
  • Shielded DN100 viewport

Evaporation Technology:

  • Thermal resistance evaporation
  • Temperature controlled organic evaporation
  • RF, DC or DC Pulsed Magnetron sputtering
  • RF Magnetron sputtering with reactive gases and upstream or downstream control (mass flow controller)
  • Electron beam evaporation with multiple pocket arrangements
  • (Available in various combinations)

Substrate Size:

  • * For substrates up to 300x300 mm or 300 mm wafers (*depending on source configuration)

Substrate Fixture:

  • Available on request for substrates and/or masking assembly
  • Heated/cooled substrate holder from -30°C up to 100°C

Substrate Rotation:

  • Optional up to 33 RPM

Vacuum pump configurations:

  • Rough vacuum: Oil-sealed rotary vane pumps
  • Dry scroll vacuum pumps
  • High Vacuum: Turbomolecular pumps with a pumping speeds of 260 l/s, 560 l/s or1100 l/s
  • Cryogenic-pumps with pumping speeds up to 1200 l/s
  • * Other pump configurations on request

Vacuum Measurement:

  • Wide range vacuum gauge (Pirani/Penning)

Ultimate Vacuum:

  • Depending on the final vacuum pump and source configuration down to: < 9 x 10-7 mbar

System Control:

  • Siemens PLC with multi-color touch screen
  • Inficon controller for rate control/monitoring
  • Recipe management

Substrate Pretreatment:

  • Integrated quartz lamp heaters
  • Optional in-situ systems available on request

Related Products

MB-EcoVap

The MB-EcoVap tool is a high quality economic research solution when the available laboratory space is restricted. Even though compact in design all essential features for high-quality functional coatings are incorporated in its standard configuration, making it the perfect entry model for many research groups who have decided to take the first steps in exploring vacuum coating technology.

MB-ProVap-3

The MB-ProVap-3 is a research and development tool for thin film deposition under vacuum conditions. The rectangular shaped chamber offers additional space for more sources and optional upgrades such as substrate heating and advanced masking solutions.

MB-ProVap-5

The MB-ProVap-5 is a versatile research and development tool for thin film deposition under vacuum conditions. The medium size chamber offers additional space for more sources and optional deposition tools such as substrate heating and masking.

MB-ProVap-7

The MB-ProVap-7 is our large chamber research and development tool for thin film deposition under vacuum conditions. The large size chamber offers additional space for more sources and optional deposition tools such as substrate heating and masking.

MB-Sources

Thin film deposition systems by MBRAUN include a variety of ways of depositing layers of material onto substrates. Our systems can be custom configured to include different coating techniques to meet the customer's exact specification.