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Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) has emerged as an important technique for depositing thin films for a variety of applications. Semiconductor processing has been one of the main motivations for the recent development of ALD.

Based on an in-depth understanding of the requirements of ALD, MBRAUN has defined the integration standards and proven design rules that allow incorporating almost any kind of ALD system into clean environments. From manually operated systems and semi-automatic solutions up to complete fully-automatic assembly lines MBRAUN has an ALD integration solution for you.

Please contact us for more information regarding choosing the right ALD system for your application.

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